Semiconductor Metallurgist for Patent Infringement
An expert in semiconductor metallurgy and the use of a titanium chloride chemical vapor deposition (CVD) process in the manufacturing of semiconductors was needed for commercial litigation. This was a patent infringement case in which both parties designed and produced microprocessors and low-power processor solutions for the computer, communications, and consumer electronics industries. At issue was the technology for contact plug and interconnect employing a barrier lining and a backfilled conductor material.
IMS ExpertServices was asked to locate a semiconductor metallurgy expert to examine the plaintiff’s process documents and opine in a written report on the formation of a titanium layer in the titanium chloride chemical vapor deposition process.
This gallium nitride LED expert has over 28 years of experience in electrical engineering and physics. He began his career with General Electric (GE) as a technical staff member. He is active in developing a major university’s laboratory research in compound semiconductor materials and related graduate courses. He has a B.S. in electrical engineering, an M.S. in electro-physics, and a Ph.D. in electrical engineering. He is researching experimental techniques for the fabrication of complex crystalline structures with unique semiconducting properties. He has extensive experience with GAN LEDs and related electronics. IMS Reference #5008114
This chemical engineering expert has over 15 years of experience as a researcher and professor of chemical engineering. He has conducted semiconductor metallurgy research projects on metal organic Chemical Vapor Deposition (CVD) of High-Temperature Superconductor Thin Films. His research is currently focused on new materials and synthetic routes for inorganic membranes and the surface modification of nanoparticles. He has a B.S. in chemical engineering and a Ph.D. in engineering, with a concentration in solid state chemistry. He has been conducting research on CVD processes since 1990. His current research is concentrating on the application of CVD and atomic layer deposition (ALD) to membrane synthesis. A current project at his lab at the university involves creating a barrier layer with titanium nitride with ALD. IMS Reference #5008146
This semiconductor technology expert has over 25 years of experience with semiconductor metallurgy. He began his career in semiconductor operations and has held a variety of positions relating to the research and development of high-speed silicon devices. He has held an editorial position with the Journal of Semiconductor Technology and Science since 2002. He has a B.A., an M.S., and a Ph.D. in physics. He is the author of the most widely used textbook on micro-fabrication. IMS Reference #5008171